Textul licitației

i-line stepper in the same facility. The tool features open cassette loading stations, spin coating and developing stations and hot and cool plates, and a module for integration with the DUV exposure tool. The tool also should have an option of extracting processed wafers in open cassettes. The coating and developing track tool is intended to support silicon semiconductor front end processing of 200 mm wafers, facilitating exposure by DUV stepper or other exposure tool. To this end, it must be capable of priming wafers with HMDS, coating wafers with DUV resist and with BARC, and developing DUV and i-line types of exposed resist, with the associated heating and cooling arrangements. The technical specification of the object of the tender is described in more detail in this Annex 1 of the invitation to tender. The tendered Tool must comply with all technical properties and functionalities